In situ Raman spectroscopy of silicon surfaces during SF6 plasma etching Brault, P. ; Mathias, J. ; Laure, C. ; Ranson, P. ; Texier, O. Abstract Publication: Journal of Physics Condensed Matter Pub Date: January 1994 DOI: 10.1088/0953-8984/6/1/001 Bibcode: 1994JPCM....6L...1B