Structure of polycrystalline silicon thin film fabricated from fluorinated precursors by layer-by-layer technique
Abstract
In this report, we describe the structure of poly Si fabricated by the LL technique, measured using the field-emission scanning electron microscope (FE-SEM) and transmittance electron microscope (TEM).
- Publication:
-
Japanese Journal of Applied Physics Regular Papers Short Notes and Review Papers
- Pub Date:
- January 1994
- Bibcode:
- 1994JJAPR..33...51I
- Keywords:
-
- Field Emission;
- Polycrystals;
- Semiconducting Films;
- Silicon Films;
- Thin Films;
- Crystal Growth;
- Microelectronics;
- Scanning Electron Microscopy;
- Transmittance;
- Electronics and Electrical Engineering