Effect of electron cyclotron resonance H/sup +/, Ne/sup +/, Ar/sup +/, and Xe/sup +/ plasma precleaning on titanium silicide formation
Abstract
- Publication:
-
IEEE Transactions on Electron Devices
- Pub Date:
- August 1994
- DOI:
- 10.1109/16.297735
- Bibcode:
- 1994ITED...41.1396T