Plasma impulse CVD deposited TiO2 waveguiding films: Properties and potential applications in integrated optical sensor systems
Abstract
Plasma impulse chemical vapor deposition (CVD) deposited titania thin films, deposited at low substrate temperatures, exhibit low volume losses of less than 0.2 dB/cm and high environmental stability. Their use in novel concepts for integrated optical immunosensors is discussed.
- Publication:
-
NASA STI/Recon Technical Report A
- Pub Date:
- 1992
- Bibcode:
- 1992STIA...9579994H
- Keywords:
-
- Integrated Optics;
- Thin Films;
- Titanium Oxides;
- Vapor Deposition;
- Waveguides;
- Film Thickness;
- Low Temperature;
- Microstructure;
- Optical Properties;
- Surface Roughness;
- Solid-State Physics