Continuous-slope phase-shift transition Pfau, Anton K. ; Scheckler, Edward W. ; Newmark, David M. ; Neureuther, Andrew R. Abstract Publication: 11th Annual BACUS Symposium on Photomask Technology Pub Date: January 1992 DOI: 10.1117/12.56953 Bibcode: 1992SPIE.1604..308P