Chemical vapor deposition of copper via disproportionation of hexfluoroacetylacetonato(1,5-cyclooctadiene) copper(I), (hfac)Cu(1,5-COD)
Abstract
- Publication:
-
Journal of Materials Research
- Pub Date:
- February 1992
- DOI:
- 10.1557/JMR.1992.0261
- Bibcode:
- 1992JMatR...7..261J