Vertically integrated high-silica channel waveguides on Si
Abstract
For the first time the vertical integration of high-silica content low-loss channel waveguides on an Si substrate is reported. The fabrication process, which has made the vertical integration feasible, consists of a practical multistep combination of flame hydrolysis deposition (FHD), photolithographic patterning, and reactive ion etching. The successful application to a double integration of single-mode waveguides at 1.55 micron is also reported. This result, which has been possible thanks to the FHD peculiarities, by extending the optical interaction to a third dimension, opens a wide range of original and promising applications, such as vertically coupled devices or parallel optical signal processes, and it effectively increases the density of optical guided-wave functions available on the same substrate.
- Publication:
-
Electronics Letters
- Pub Date:
- February 1992
- DOI:
- 10.1049/el:19920275
- Bibcode:
- 1992ElL....28..437B
- Keywords:
-
- Channels (Data Transmission);
- Integrated Optics;
- Optical Waveguides;
- Photolithography;
- Pyrohydrolysis;
- Signal Processing;
- Germanium Oxides;
- Optical Communication;
- Phosphorus Oxides;
- Silicon;
- Stereoscopic Vision;
- Substrates;
- Optics