Direct observation of chemical vapor deposited diamond films by atomic force microscopy
Abstract
Diamond polycrystals deposited by the hot-filament chemical vapor deposition method on silicon (100) substrates have been examined by atomic force microscopy (AFM) in air. Measurements of the diamond unit cell show periodic spacings between 0.34 to 0.37 nm in a very good agreement with the theoretical value of the bulk constant of natural diamond (0.356 nm). Hybridized sp3 bonds can also be observed at the (111) surface.
- Publication:
-
Applied Physics Letters
- Pub Date:
- March 1992
- DOI:
- 10.1063/1.107253
- Bibcode:
- 1992ApPhL..60.1567B
- Keywords:
-
- Crystal Growth;
- Diamond Films;
- Electron Microscopy;
- Thin Films;
- Vapor Deposition;
- Lattice Parameters;
- Silicon;
- Single Crystals;
- Surface Properties;
- Solid-State Physics