Low-pressure CVD of LaB6 for cold cathode devices
Abstract
A study of the low-pressure chemical vapor deposition of lanthanum hexaboride, a low work function material, is reported. The activation energy was measured to be 42.7 kJ/mol; the deposits are fine-grained and polycrystalline, with an average grain size of 5-10 microns. This structure is suitable for cold cathode devices. Details of the deposition and characterization of LaB6 are discussed.
- Publication:
-
36th International SAMPE Symposium and Exhibition
- Pub Date:
- 1991
- Bibcode:
- 1991sampesymp..468J
- Keywords:
-
- Boron Compounds;
- Cold Cathodes;
- Lanthanum Compounds;
- Low Pressure;
- Vapor Deposition;
- Crystal Growth;
- Electrode Materials;
- Electronics and Electrical Engineering