Deposition of diamond-like carbon film using electron cyclotron resonance plasma
Abstract
Hard diamond-like carbon films were deposited on Si(100) substrates using a CH4 plasma created through electron cyclotron resonance (ECR) heating. The ECR plasma was excited by a Lisitano coil. These films could be deposited with a negative dc bias (-200 V) or a rf-induced negative self-bias (-100 V) on the substrates. The deposition rate of the film was about 2.3 Å/s. The deposited films were characterized by Raman spectroscopy and near-edge x-ray absorption fine structure analysis.
- Publication:
-
Applied Physics Letters
- Pub Date:
- November 1991
- DOI:
- 10.1063/1.105943
- Bibcode:
- 1991ApPhL..59.2532K
- Keywords:
-
- Carbon;
- Deposition;
- Diamonds;
- Electron Cyclotron Heating;
- Plasma Spraying;
- Thin Films;
- Cyclotron Resonance;
- Methane;
- Radio Frequency Discharge;
- Solid-State Physics