Soft-x-ray multilayer gratings with subhalfmicron period
Abstract
Soft-x-ray multilayer gratings with a subhalfmicron period (360 nm) are produced using uv holography and reactive ion etching. The multilayers are fabricated by a triode sputtering technique. The diffraction patterns of these new optical devices are measured at the Cu Lα, β wavelength (1.33 nm). The results are discussed within the framework of a scalar diffraction theory of relief gratings.
- Publication:
-
Optics Communications
- Pub Date:
- April 1990
- DOI:
- 10.1016/0030-4018(90)90303-B
- Bibcode:
- 1990OptCo..76..111B