Growth of diamond by atomic vapor deposition
Abstract
Diamond has been synthesized by a new vacuum deposition method called atomic vapor deposition (AVD). In AVD, most of the evaporated carbon is decomposed to atomic carbon. Diamond growth has been achieved on Si(100) surfaces using AVD at a substrate temperature of 800 C in a hydrogen atmosphere at 0.0002 torr. The average diamond crystalline size, as determined by TEM, is 2000 A with a number density of 2 x 10 to the 8th/sq cm. It is found that diamond can be deposited at low pressure by the deposition of atomic carbon with the aid of hydrogen.
- Publication:
-
Journal of Crystal Growth
- Pub Date:
- January 1990
- DOI:
- 10.1016/S0022-0248(08)80105-4
- Bibcode:
- 1990JCrGr..99.1188K
- Keywords:
-
- Crystal Growth;
- Diamonds;
- Low Pressure;
- Vapor Deposition;
- Carbon;
- Electron Microscopy;
- Hydrogen;
- Solid-State Physics