Properties of devices prepared with epitaxial layers on InP
Abstract
Electrical measurements were made on capacitors prepared with remote plasma-enhanced chemical vapor deposition (RPECVD) SiO2 films on p-type Ga(0.47)In(0.53)As at low substrate temperatures. These measurements demonstrated that the RPECVD dielectric is suitable for use in the fabrication of MISFETs. Measurements on RPECVD SiO2 layers on Si showed that care must be taken in cleaning and processing to prevent Na ions from being introduced into the dielectric layers. To provide stable characteristics, surface cleaning before deposition must be investigated and processing techniques must be used to prevent the introduction of mobile ions into the deposited dielectric layers. Techniques to reduce the temperature sensitivity of the threshold current density of InP-Ga(x)In(1-y) DH (double heterostructure) lasers were investigated. The most promising technique is the use of thin pseudomorphic active layers and wide energy gap cladding layers.
- Publication:
-
Final Report
- Pub Date:
- March 1989
- Bibcode:
- 1989duke.rept.....C
- Keywords:
-
- Capacitors;
- Dielectrics;
- Electrical Properties;
- Epitaxy;
- Indium Phosphides;
- Mis (Semiconductors);
- Semiconductor Lasers;
- Vapor Deposition;
- Current Density;
- Electrical Measurement;
- Gallium Arsenides;
- Indium Arsenides;
- Low Temperature;
- Silicon Dioxide;
- Surface Finishing;
- Thin Films;
- Solid-State Physics