Deceleration of ion beams for film deposition by an electrostatic field

For the practical use of ion beam deposition (IBD), the deceleration characteristics of Ar ⁺ ion beams of the order of mA and of 10 kV were investigated by using an electrostatic field of a flat deposition electrode. The experiments were carried out by means of measurement of the electrode currents of a deceleration unit settled in an electromagnetic isotope separator and by photographic observation of the ion beams. A preliminary Si deposition was attempted and a metallic film appearance was obtained on an Al ₂O ₃ substrate.