Preparation of BaF2 films by metalorganic chemical vapor deposition
Abstract
To date thin films of II(a) fluorides (CaF2, BaF2, SrF2, and their mixtures) have only been deposited by physical vapor deposition techniques. We report for the first time the deposition of BaF2 films on silicon and yttrium-stabilized zirconia substrates by metalorganic chemical vapor deposition at a substrate temperature as low as 400 °C.
- Publication:
-
Journal of Applied Physics
- Pub Date:
- December 1989
- DOI:
- 10.1063/1.343553
- Bibcode:
- 1989JAP....66.6179S
- Keywords:
-
- Barium Fluorides;
- Epitaxy;
- Organometallic Compounds;
- Thin Films;
- Vapor Deposition;
- Electron Microscopy;
- Integrated Circuits;
- X Ray Diffraction;
- Zirconium Oxides;
- Solid-State Physics