Measurement of passive film growth kinetics on bare surface band microelectrodes
Abstract
A new method has been developed for the study of bare surface electrochemistry at shorter times and higher current densities than those conventionally achieved. This technique involves in situ fracture of a sputtered metal film between two glass slides to create a band microelectrode. This has the advantage over electrodes of conventional size of an increase in the rate of mass transport to and from the surface and reduction in the ohmic (IR) drop. The bare microelectrode method has been used to study the repassivation kinetics of sputtered niobium films.
- Publication:
-
Presented at the Electrochemical Society Fall Meeting
- Pub Date:
- 1988
- Bibcode:
- 1988ecs..meet.....D
- Keywords:
-
- Crystal Growth;
- Current Density;
- Electrochemistry;
- Electrodes;
- Kinetics;
- Metal Surfaces;
- Thin Films;
- Niobium;
- Sputtering;
- Solid-State Physics