Negative electron resists generally exhibit excellent sensitivity, but suffer from swelling during development which results in poor resolution. A new approach to this problem is presented, in which reactive monomers are blended with host polymers to provide sensitive negative resists with improved resolution. Polychloromethylstyrene (PCMS) and VMCH (a terpolymer containing 86 percent vinyl chloride, 13 percent vinyl acetate and 1 percent maleic acid) were both found to be compatible with two reactive monomers, trimethylolpropanetrimethacrylate (TMPTMA) and dipentaerythritolpentaacrylate (DPEPA). Addition of 20 percent (w/w) of either monomer to PCMs or VMCH resulted in approximately tenfold increases in sensitivity.
NASA STI/Recon Technical Report N
- Pub Date:
- May 1988
- Electron Beams;
- Polymer Physics;
- Electronics and Electrical Engineering