Corner compensation structures for (110) oriented silicon
Abstract
The use of (110) oriented silicon wafers has been studied for the fabrication of microscale mechanisms such as cantilever beams and latching mechanisms. Using this orientation, cantilever beams can be fabricated such that they deflect in a parallel direction to the wafer surface. It might be possible to fabricate structures such as setback accelerometers and latching mechanisms with (110) silicon cantilevers. Corner compensation structures have been designed and fabricated for use with (110) oriented cantilever beams.
- Publication:
-
IEEE Micro Robots and Teleoperators Workshop: An Investigation of Micromechanical Structures, Actuators and Sensors
- Pub Date:
- November 1987
- Bibcode:
- 1987mrt..work.....C
- Keywords:
-
- Corners;
- Crystal Structure;
- Instrument Compensation;
- Semiconductor Devices;
- Silicon;
- Wafers;
- Etching;
- Fabrication;
- Silicon Nitrides;
- Solid-State Physics