Excimer lasers and optics; Proceedings of the Meeting, Cambridge, MA, Sept. 18, 19, 1986

Papers are presented on high average power commercial excimer lasers, inductively stabilized excimer lasers, large excimer lasers for fusion, and advances in excimer laser lithography. Also considered are laser photochemical vapor deposition, an excimer laser etching mechanism using laser-induced fluorescence measurements, the generation of subnanosecond excimer laser pulses by means of stimulated Brillouin scattering in liquids, and excited state excimer spectroscopy. Other topics include amplification in a XeCl excimer gain module of 200-fsec UV pulses derived from a colliding pulse mode-locked laser system, a multikilojoule narrowband XeCl laser, a long-pulse e-beam pumped excimer laser, and high order multiphoton processes observed with subpicosecond excimer lasers.