Problems of lithography in microelectronics
Abstract
The papers presented in this volume provide an overview of the current status of lithographic techniques used in the production of microcircuits. In particular, attention is given to the modeling of latent image formation in electron lithography, the mechanism of the nonlinear variation of the characteristics of positive photoresists during laser exposure, and X-ray lithography using synchrotron radiation. Papers are also included on electron lithography with the use of high-contrast stencil masks, titanium disilicide films for the metallization of connections in VLSI circuits, and a theoretical and experimental study of the Josephson effect in SN-N-NS submicron structures.
- Publication:
-
Moscow Izdatel Nauka
- Pub Date:
- 1987
- Bibcode:
- 1987MoIzN...8.....M
- Keywords:
-
- Fabrication;
- Lithography;
- Microelectronics;
- Cold Plasmas;
- Etching;
- Integrated Circuits;
- Laser Applications;
- Polymers;
- Polymethyl Methacrylate;
- Silicides;
- Silicon Dioxide;
- Synchrotron Radiation;
- Titanium Compounds;
- X Ray Apparatus;
- Electronics and Electrical Engineering