Nb-Pb-Nb Planar Josephson Junction Fabricated by RIE
Abstract
Nb-Pb-Nb planar Josephson junctions were fabricated by electron-beam exposure and Reactive-Ion-Etching (RIE) and their response characteristics under millimeter-and submillimeter-wave radiation were investigated. The size of the weak-link was 0.67-1.0 micrometers long, 5.0 micrometers wide and 1000Å thick. The fourth Shapiro step under 70 GHz millimeter-wave radiation could be observed. On the other hand, the planar junctions showed only a bolometric response under 891 GHz submillimeter-wave radiation. In this paper, the characteristics of RIE using a CBrF3 gas as the etchant and an electron beam resist, PMMA, as the mask material are also discussed.
- Publication:
-
Japanese Journal of Applied Physics
- Pub Date:
- July 1986
- DOI:
- 10.1143/JJAP.25.1011
- Bibcode:
- 1986JaJAP..25.1011Y
- Keywords:
-
- Electron Beams;
- Etching;
- Fabrication;
- Infrared Detectors;
- Josephson Junctions;
- Microwave Sensors;
- Gas Lasers;
- Lead (Metal);
- Millimeter Waves;
- Niobium;
- Polymethyl Methacrylate;
- Submillimeter Waves;
- Temperature Dependence;
- Electronics and Electrical Engineering