Synthesis of A15 Nb-Si Films on Si-Precoated Substrate Using Dual-Target Sputtering
Abstract
This paper describes metastable A15 Nb-Si films synthesized by dual-target dc-magnetron sputtering. The approximate 40-Å Si precoating on a surface of sapphire substrates is found to greatly affect the suppression of a competing stable Ti3P-type phase formation. It is confirmed that Tcon (1% onset of superconductivity)> 13 K films can be prepared with good reproducibility using compositional grading. The crystal growth of A15 Nb-Si films on Si-precoated substrates is investigated and a model for A15 film growth is presented.
- Publication:
-
Japanese Journal of Applied Physics
- Pub Date:
- July 1986
- DOI:
- 10.1143/JJAP.25.997
- Bibcode:
- 1986JaJAP..25..997N
- Keywords:
-
- Magnetron Sputtering;
- Niobium Compounds;
- Phase Diagrams;
- Superconductivity;
- Thin Films;
- Transition Temperature;
- Lattice Parameters;
- Metastable State;
- Sapphire;
- Silicides;
- Substrates;
- X Ray Diffraction;
- Solid-State Physics