Method of chemically polishing quartz crystal blanks
Abstract
The general object of this invention is to provide a method of chemically polishing quartz crystal blanks. A more specific object is to provide such a method wherein the resulting chemically polished blanks will be suitable for use in resonators and oscillators. Quartz crystal blanks are chemically polished by thoroughly cleaning the blanks, treating the quartz crystal blanks with an etching solution at high pressures in a high pressure vessel while agitating to circulate the etchant and maintaining a uniform temperature throughout the etching solution, cooling the vessel, removing the quartz crystal blanks, rinsing thoroughly with water and spinning dry.
- Publication:
-
Patent Application Department of the Army
- Pub Date:
- September 1985
- Bibcode:
- 1985army.reptZ....B
- Keywords:
-
- Blanks;
- Chemical Cleaning;
- Polishing;
- Quartz Crystals;
- Cooling;
- Etching;
- High Pressure;
- Oscillators;
- Patent Applications;
- Pressure Vessels;
- Resonators;
- Engineering (General)