X-ray section topography in synchrotron radiation

On account of the low intensity of the employed X-ray tubes, the application possibilities of X-ray section topography are currently limited. The present study has the objective to show that these limitations can be eliminated by utilizing synchrotron radiation. This step makes it possible to establish X-ray section topography as an effective, nondestructive, and rapid method for monitoring the structural quality of semiconductor materials. An arrangement for recording X-ray section topograms in the spectrum of synchrotron radiation is discussed, taking into account a rotating magnet, collimators, and a photographic plate as detector. Attention is also given to X-ray section topograms and corresponding diagrams of the stress state near a groove formed in silicon by a laser beam.