EPR Monitoring of Annealing Effects in F-Implanted Amorphous Silicon Goltzene, A. ; Meyer, B. ; Schwab, C. ; Liu, X. H. ; Bohringer, K. ; Kalbitzer, S. Abstract Publication: Physica Status Solidi Applied Research Pub Date: September 1985 DOI: 10.1002/pssa.2210910150 Bibcode: 1985PSSAR..91...45G