High-Speed Low-Power Ring Oscillator Using Inverted-Structure Modulation-Doped GaAs/n-AlGaAs Field-Effect Transistors
Abstract
Modulation-doped GaAs/n-AlGaAs field-effect transistors with inverted structures, i.e. undoped GaAs on top of n-AlGas, have been successfully used in E/D-type DCFL ring oscillators. An inverted heterojunction structure grown by MBE showed a high electron mobility of about 20,000-92,000 cm2/(Vs) at 77 K. In the enhancement mode (E-mode) FETs with 1.2 μm gate length, a maximum transconductance of 250 mS/mm and a K-value of 7.3 mA/V2 were achieved at 77 K. Low ohmic contact resistances of 0.1-0.4 \varOmegamm with a mean value of 0.2 \varOmegamm were obtained in a 2 inch-diameter wafer at 300 K and 77 K. A 21-stage ring oscillator showed a minimum gate delay of 26.3 ps with a power dissipation of 234 μW/gate at 77 K.
- Publication:
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Japanese Journal of Applied Physics
- Pub Date:
- August 1985
- DOI:
- Bibcode:
- 1985JaJAP..24.1061K
- Keywords:
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- Aluminum Gallium Arsenides;
- Field Effect Transistors;
- Gallium Arsenides;
- Heterojunction Devices;
- High Electron Mobility Transistors;
- Oscillators;
- Electrical Resistance;
- Leakage;
- Performance Tests;
- Volt-Ampere Characteristics;
- Electronics and Electrical Engineering