Direct writing of microstructures for microelectronics
Abstract
A program to investigate direct laser writing for semiconductor processing is described. In this program the following results were obtained: The first reported fabrication of submicrometer diffraction gratings in GaAS; Development of a new technique for writing patterns of the dielectric material, SiO2; Measurement of the conductivity and properties of metal interconnects; The first demonstration of laser-enhanced plasma etching; and The first observation of deep-UV enhanced liquid etching of GaAS.
- Publication:
-
Columbia Univ. Annual Report
- Pub Date:
- July 1984
- Bibcode:
- 1984cuny.rept.....O
- Keywords:
-
- Etching;
- Fabrication;
- Laser Applications;
- Microelectronics;
- Microstructure;
- Semiconductor Devices;
- Semiconductors (Materials);
- Dielectrics;
- Diffraction Patterns;
- Gallium Arsenides;
- Gratings (Spectra);
- Lasers;
- Electronics and Electrical Engineering