Planar techniques for fabricating X-ray diffraction gratings and zone plates
Abstract
The state of current planar techniques in the fabrication of Fresnel zone plates and diffraction gratings is reviewed. Among the fabrication techniques described are multilayer resist techniques; scanning electron beam lithography; and holographic lithography. Consideration is also given to: X-ray lithography; ion beam lithography; and electroplating. SEM photographs of the undercut profiles obtained in a type AZ 135OB photoresistor by holographic lithography are provided.
- Publication:
-
NASA STI/Recon Technical Report A
- Pub Date:
- September 1984
- Bibcode:
- 1984STIA...8543275S
- Keywords:
-
- Gratings (Spectra);
- Lithography;
- X Ray Diffraction;
- Electron Beams;
- Electroplating;
- Holography;
- Ion Beams;
- Electronics and Electrical Engineering