Laser photodeposition and photoetching study
Abstract
Work during this quarter has developed a new technique for direct-write etching of Al and Al:Si:Cu alloys, and has applied this new process to correction of bridging faults in VLSI signal-processing circuits. Additional work has expanded upon two excimer-laser resist processes to develop fast deep-UV lithographic procedures based on these powerful UV sources. A final series of experiments has extended pulsed UV-laser reactions to area photodeposition of Al2O3 films.
- Publication:
-
Massachusetts Inst. of Tech. Report
- Pub Date:
- March 1983
- Bibcode:
- 1983mit..reptQ....E
- Keywords:
-
- Deposition;
- Etching;
- Integrated Circuits;
- Photolithography;
- Very Large Scale Integration;
- Aluminum Alloys;
- Copper Alloys;
- Laser Applications;
- Pulsed Lasers;
- Signal Processing;
- Silicon Alloys;
- Ultraviolet Radiation;
- Solid-State Physics