Properties of variable-thickness NbN microbridges
Abstract
Variable-thickness NbN microbridges have been fabricated by ion etching, using photoresist mask and obliquely evaporated Al films. A tungsten needle ≈3 µm in diameter is placed across the slit produced in the photoresist to define the bridge width. The NbN microbridges show many well-defined constant-voltage steps under microwave irradiation.
- Publication:
-
Journal of Low Temperature Physics
- Pub Date:
- February 1983
- DOI:
- 10.1007/BF00681608
- Bibcode:
- 1983JLTP...50..311S