Deep-ultraviolet spatial-period division using an excimer laser
Abstract
The deep-UV output from an ArF laser and a grating mask with 199-mm spatial period has been used to fabricate a 99.5-mm period grating pattern in polymethyl methacrylate resist by spatial period division. For sub 100 nm, lithography of periodic and quasi-periodic patterns (including Fresnel zone plates) by spatial-period division, deep UV radiation offers a number of advantages over soft X rays.
- Publication:
-
Optics Letters
- Pub Date:
- September 1982
- Bibcode:
- 1982OptL....7..402S
- Keywords:
-
- Excimer Lasers;
- Gratings (Spectra);
- Photolithography;
- Rare Gas-Halide Lasers;
- Ultraviolet Lasers;
- Fabrication;
- Fresnel Diffraction;
- Masking;
- Polymethyl Methacrylate;
- Lasers and Masers