Ultraviolet And X-Ray Lithography
Abstract
Characteristics of the generation and absorption of ultraviolet radiation and x-rays are examined for their effects on lithographic replication of tine scale features. Direct-write, projection, proximity and contact UV lithography are Drietly reviewed. Emphasis is given to x-ray lithography, especially the wide variety of potentially useful plasma x-ray sources. Reference is also made to other aspects of x-ray lithography, namely masks, resists and alignments, as well as full x-ray exposure systems.
- Publication:
-
Ultraviolet and vacuum ultraviolet systems
- Pub Date:
- November 1981
- DOI:
- 10.1117/12.965712
- Bibcode:
- 1981SPIE..279...98N
- Keywords:
-
- Lithography;
- Pattern Registration;
- Plasma Radiation;
- Ultraviolet Absorption;
- Ultraviolet Radiation;
- X Rays;
- Electron Impact;
- Fineness;
- Microstructure;
- Radiation Absorption;
- Electronics and Electrical Engineering