Surface microanalysis techniques for characterization of thin films
Abstract
With the advent of lower wavelength systems, increased sophistication of functional requirements, and higher incident radiation levels, more stringent demands have been placed on coating depositions with complimentary detailed chemical and physical characterizations being required. Scanning auger microscopy, X-ray photoelectron spectroscopy, and secondary ion mass spectroscopy techniques were applied to thin film coatings to detect and identify compositional and structural irregularities. Impurity sites in ThF4 and ZnS films, principle causes of poor coating performance, were isolated and analyzed. Point maps, line scans, and depth profiles are shown to provide remarkable clarity with submicron resolution. Abnormal oxygen content in ThF4 films indicates the presence of water and may eliminate its use as a coating material for HF systems. Although these surface analysis methods are destructive by nature, the validity of their use in analyzing thin film coatings is demonstrated and establishes a precedent for coating development progress.
- Publication:
-
Laser Induced Damage in Optical Materials
- Pub Date:
- July 1980
- Bibcode:
- 1980nlid.rept..257H
- Keywords:
-
- Laser Materials;
- Microanalysis;
- Microstructure;
- Surface Defects;
- Surface Layers;
- Thin Films;
- Auger Spectroscopy;
- Destructive Tests;
- Mass Spectrometers;
- Spectroscopic Analysis;
- Sputtering;
- X Ray Analysis;
- Lasers and Masers