Quantitative Evaluation of Proximity Effect in Raster-Scan Exposure System for Electron-Beam Lithography
Abstract
- Publication:
-
IEEE Journal of Solid-State Circuits
- Pub Date:
- August 1980
- DOI:
- 10.1109/JSSC.1980.1051433
- Bibcode:
- 1980IJSSC..15..525N