Micro-lithography for planar devices. II
Abstract
It is noted that in the previous paper the various processes for micron and sub-micron technology were described. In the present paper, attention is given to the choice criteria for the most economical process, the development of photo-resists more sensitive to radiation, test methods for masks and structures, as well as fundamental limits for further reductions of dimensions.
- Publication:
-
Wissenschaftliche Berichte AEG Telefunken
- Pub Date:
- 1979
- Bibcode:
- 1979WisBT..52..231H
- Keywords:
-
- Lithography;
- Microelectronics;
- Microwave Equipment;
- Planar Structures;
- Semiconductor Devices;
- Cost Analysis;
- Electron Beams;
- Millimeter Waves;
- Polymers;
- Submillimeter Waves;
- Electronics and Electrical Engineering