Post-gate plasma and sputter process effects on the radiation hardness of metal gate CMOS integrated circuits
Abstract
- Publication:
-
IEEE Transactions on Nuclear Science
- Pub Date:
- December 1978
- DOI:
- 10.1109/TNS.1978.4329553
- Bibcode:
- 1978ITNS...25.1459A
- Keywords:
-
- Cmos;
- Electric Potential;
- Gates (Circuits);
- Integrated Circuits;
- Plasma Spraying;
- Radiation Hardening;
- Sputtering;
- Annealing;
- Gamma Rays;
- Ionizing Radiation;
- Passivity;
- Radiation Dosage;
- Semiconducting Films;
- Silicon Nitrides;
- Stress Measurement;
- Thresholds;
- Electronics and Electrical Engineering