Microstructure fabrication
Abstract
Processes involved in the fabrication of microstructure for integrated electronics are discussed. Attention is given to a pattern developed in photoresist for use as an ion-milling mask, a diode fabricated on the surface of a wafer of silicon, a standing wave pattern developed in a layer of photoresist, and the masking of the etching of a hole in SiO2 by an opening in the photoresist.
- Publication:
-
Science
- Pub Date:
- May 1977
- DOI:
- Bibcode:
- 1977Sci...196..945K
- Keywords:
-
- Fabrication;
- Integrated Circuits;
- Microelectronics;
- Microstructure;
- Ion Impact;
- Photomechanical Effect;
- Silicon Dioxide;
- Surface Layers;
- Thin Films;
- Electronics and Electrical Engineering