Binary phase digital reflection holograms: Fabrication and potential applications
Abstract
A novel technique for the fabrication of binary-phase computer-generated reflection holograms is described. By use of integrated circuit technology, the holographic pattern is etched into a silicon wafer and then aluminum coated to make a reflection hologram. Because these holograms reflect virtually all the incident radiation, they may find application in machining with high-power lasers. A number of possible modifications of the hologram fabrication procedure are discussed.
- Publication:
-
Applied Optics
- Pub Date:
- February 1977
- DOI:
- 10.1364/AO.16.000413
- Bibcode:
- 1977ApOpt..16..413G
- Keywords:
-
- Digital Techniques;
- Holography;
- Imaging Techniques;
- Fabrication;
- Fourier Transformation;
- Integrated Circuits;
- Optical Reflection;
- Wave Front Reconstruction;
- Instrumentation and Photography;
- HOLOGRAPHY