Photoresist application by roller coating
Abstract
Roller coating of AZ1350J photoresist onto 3.75- by 4.5-inch (95 by 114 mm) substrates was investigated as an integral part of an overall, cost effective hybrid microcircuit (HMC) photolithography process. New equipment was needed to process multiple HMCs on a single substrate with sufficient parameter control to achieve the designed electrical characteristics. The roller coater study centered around the investigation and the control of those parameters which influence the dimensional quality of the thin-film, resistor-conductor pattern. General system operation, orientation to other processing equipment, and maintenance-facility considerations were also studied. The most important technical aspect of the photoresist coating is the thickness uniformity followed by the overall photoresist thickness. Three equipment variables: doctor bar pressure, roller/substrate interference, and roller thread configuration were found to control the overall resist thickness and thickness uniformity.
- Publication:
-
NASA STI/Recon Technical Report N
- Pub Date:
- August 1976
- Bibcode:
- 1976STIN...7720345S
- Keywords:
-
- Coatings;
- Hybrid Circuits;
- Microelectronics;
- Photoconductors;
- Rollers;
- Thin Films;
- Cost Effectiveness;
- Electrical Properties;
- Manufacturing;
- Substrates;
- Viscosity;
- Electronics and Electrical Engineering