Masking and duplication in the field of lines of about one micron in width. State and prospects for optical and electronic techniques

The description and characteristics are presented of microlithography processes adapted to the drawing of lines of about one micron wide by the planar method. These processes can be applied to the fabrication of integrated and microwave circuits on semiconductor or piezoelectric materials, and to integrated optics. The processes discussed include direct masking on a silicon plate by an electron beam, electron beam duplication, and X-ray duplication.