Molybdenum vapor phase deposition from MoCl5

The vapor phase deposition of molybdenum from the pentachloride was studied in order to obtain silicon ohmic contacts. The deposition was accomplished by reduction of MoCl5 by hydrogen in an oven heated by the Joule effect. Normally silicon N type, doped with phosphorus, was justified. The crystallography and the diameter of the deposited particles were analyzed with X-rays. The results are discussed, and it is concluded that the deposition of Mo at low temperature (500 deg) does not seem to be suitable for the production of low resistance silicon ohmic contacts.