System for deposition and hydriding of thin metallic films without air exposure
Abstract
A non-air exposed hydriding/deposition system provides advanced processing capability for hydriding erbium thin films. The system is designed with precise controls for cold crucible electron beam deposition of erbium, film deposition monitoring, and temperature bakeout. Using a mechanical transfer device, a complete hydriding process for erbium deposited films can be completed without air exposure. The system offers many processing improvements such as the ability to make gas analyses during various phases of the processing (with the capability of isolating the analyzer tube when not in use), and isolation of the ion pumps for hydriding gases and atmospheric pressure. A major processing benefit is the capability to vacuum bake and hydride gas process the hydriding fixture before the disk substrates are transferred into the hydriding chamber.
- Publication:
-
NASA STI/Recon Technical Report N
- Pub Date:
- August 1974
- Bibcode:
- 1974STIN...7514008E
- Keywords:
-
- Air;
- Deposition;
- Metal Films;
- Thin Films;
- Atmospheric Pressure;
- Baking;
- Degassing;
- Exposure;
- Engineering (General)