Effect of hydrogen plasma treatment on the passivation performance of TiOx on crystalline silicon prepared by atomic layer deposition
Abstract
- Publication:
-
Journal of Vacuum Science Technology A: Vacuum Surfaces and Films
- Pub Date:
- March 2020
- DOI:
- 10.1116/1.5134720
- Bibcode:
- 2020JVSTA..38b2410M