RF multi-jet, atmospheric plasma for metal substrate cleaning
Abstract
During the manufacturing process of orthopaedic implants, the cleaning step plays an essential role to achieve the biocompatibility required for the implant to be successful. We propose a new radio frequency multi-jet atmospheric pressure, low temperature plasma process for removal of organic residues from the implant's surfaces. The advantage of this method over the ones currently in practice is the lack of remains from the added chemical cleaning agents. The plasma jets are produced using a 13.56 MHz matched RF applied voltage in a controlled He/O2/At gas mixture. The polished and rough test substrates are purposely ``spiked'' with contaminants which get in the contact with the metal surface during the manufacturing process. The cleaning efficacity is measured using FTIR and XPS.
This research was conducted with the financial support of Science Foundation Ireland (SFI) under Grant Number 12/RC/2278 and 17/SP/4721, and co-funded by the European Regional Development Fund and Science Foundation Ireland under Ireland's European Structural and Investment Fund. This research has been co-funded by the 3D Printing Centre of Excellence, Johnson & Johnson Services Inc., and DePuy Synthes.- Publication:
-
APS Annual Gaseous Electronics Meeting Abstracts
- Pub Date:
- 2020
- Bibcode:
- 2020APS..GECRW2042G