Thin SiO 2 /a-Si:H/SiO 2 multilayer insulators obtained by electron cyclotron resonance chemical vapor deposition at room temperature for possible application in non-volatile memories
Abstract
- Publication:
-
Thin Solid Films
- Pub Date:
- April 2017
- DOI:
- 10.1016/j.tsf.2017.03.023
- Bibcode:
- 2017TSF...628...96M