Fabrication of (K,Na)NbO3 films on SrRuO3/(001)SrTiO3 substrates by pulsed laser deposition
Abstract
1-3-µm-thick (K,Na)NbO3 films were epitaxially grown on SrRuO3/(001)SrTiO3 substrates by the pulsed laser deposition using (KxNa1-x)NbO3 targets. Energy dispersive X-ray spectroscopy analysis showed that the film K content was about 10% lower than the target K content x at x = 0.1-0.8, and the (K + Na)/Nb atomic ratio was 0.8-1.0. Reciprocal space mapping of the films revealed that the films were epitaxially grown at x = 0-0.7, and the crystal system was altered with increasing K content. Ferroelectric polarization-electric field loops were observed at x = 0-0.9, with the maximum remanent polarization of ∼40 µC/cm2 at x = 0.5. The remanent polarization vs K content profile was discussed with crystal structure analyses.
- Publication:
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Japanese Journal of Applied Physics
- Pub Date:
- October 2015
- DOI:
- 10.7567/JJAP.54.10NA13
- Bibcode:
- 2015JaJAP..54jNA13F