Quantifying throughput improvements for electron-beam lithography using a suite of benchmark patterns
Abstract
The Vistec VB300 Gaussian electron-beam lithography system at the College of Nanoscale Science and Engineering (CNSE) in Albany routinely exposes 300 mm wafers to meet the requirements of nano-patterning for metrology and process tool qualification. CNSE and Vistec are partners in a continuous throughput improvement program. The first stage of this program has recently been implemented on CNSE's VB300. To quantify the improvements, we have defined a suite of benchmark patterns to compare throughput "before and after", which we plan to use throughout the entire program. These benchmark patterns show throughput improvements of up to a factor of 2.5 on the VB300. We believe this method of measuring throughput could be applied to other lithography systems that exhibit a throughput dependency on pattern type.
- Publication:
-
Alternative Lithographic Technologies V
- Pub Date:
- March 2013
- DOI:
- 10.1117/12.2011664
- Bibcode:
- 2013SPIE.8680E..0PH