Photoresist removal process by hydrogen radicals generated by W catalyst Takata, M. ; Ogushi, K. ; Yuba, Y. ; Akasaka, Y. ; Tomioka, K. ; Soda, E. ; Kobayashi, N. Abstract Publication: Thin Solid Films Pub Date: January 2008 DOI: 10.1016/j.tsf.2007.06.206 Bibcode: 2008TSF...516..847T