Plasma model for charging damage
Abstract
The mechanism responsible for charging damage is treated as beam/plasma driven differences in local floating potentials on the process surface. A cold plasma flood is shown to limit these potential differences. Beam/plasma J-V characteristics obtained with CHARM2 in a high current implanter are fit with the theory. With flood OFF, the fit corresponds to plasma buildup over the target surface.
- Publication:
-
Presented at the IIT 1994 Conference
- Pub Date:
- July 1994
- Bibcode:
- 1994iit..conf...13V
- Keywords:
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- Cold Plasmas;
- Ion Beams;
- Ion Implantation;
- Plasma Potentials;
- Plasma Probes;
- Radiation Damage;
- Surface Reactions;
- Current Density;
- Mathematical Models;
- Plasma Currents;
- Plasma Physics