Confined plasmons in shallow etched quantum wires Strenz, R. ; Rosskopf, V. ; Hirler, F. ; Abstreiter, G. ; Bohm, G. ; Trankle, G. ; Weimann, G. Abstract Publication: Semiconductor Science Technology Pub Date: April 1994 DOI: 10.1088/0268-1242/9/4/011 Bibcode: 1994SeScT...9..399S